Go to Header
Go to Navigation
Go to Content
Go to Footer
Guide
Login (ext. users)
Login (JyU account)
Accessibility
Finnish (Finland)
List of people
>
Harry Whitlow
Home
Persons
Organisations
Projects
Publications
Research datasets
Fields of science
Funding programs
Keywords (YSO)
Harry
Whitlow
No active affiliation
Publications
Diffusion studies with radioactive ions
(
2014
)
Whitlow, Harry; et al.
;
A2
Advanced time-stamped total data acquisition control front-end for MeV ion beam microscopy and proton beam writing
(
2013
)
Kivistö, Henri; et al.
;
A1
Angular spreading measurements using MeV ion microscopes
(
2013
)
Whitlow, Harry; et al.
;
A1
Development of procedures for programmable proximity aperture lithography
(
2013
)
Whitlow, Harry; et al.
;
A1
Energy-loss straggling of 2–10 MeV/u Kr ions in gases
(
2013
)
Vockenhuber, Christof; et al.
;
A1
;
OA
Fast and blister-free irradiation conditions for cross-linking of PMMA induced by 2 MeV protons
(
2013
)
Unai, Somrit; et al.
;
A1
High speed microfluidic prototyping by programmable proximity aperture MeV ion beam lithography.
(
2013
)
Puttaraksa, Nitipon; et al.
;
A1
Influence of titanium-substrate roughness on Ca-P-O thin films grown by atomic layer deposition
(
2013
)
Sagari A.R. , Ananda; et al.
;
A1
Ion-induced fluorescence imaging of endosomes
(
2013
)
Norarat, Rattanaporn; et al.
;
A4
Lithographic fabrication of soda-lime glass based microfluidics
(
2013
)
Rojas, Laura; et al.
;
A1
Objective improvement of the visual quality of ion microscope images
(
2013
)
Norarat, Rattanaporn; et al.
;
A1
Why are hydrogen ions best for MeV ion beam lithography?
(
2013
)
Norarat, Rattanaporn; et al.
;
A1
Development of the Jyväskylä microbeam facility
(
2012
)
Norarat, Rattanaporn; et al.
;
A1
Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography
(
2012
)
Puttaraksa, Nitipon; et al.
;
A1
Industrial Aspects of Ion Beam Analysis
(
2012
)
Hellborg, R.; et al.
;
A3
Influence of MeV H^{+} ion beam flux on cross-linking and blister formation in PMMA resist
(
2012
)
Unai, S.; et al.
;
A1
;
OA
Lithography exposure characteristics of poly(methyl methacrylate) (PMMA) for carbon, helium and hydrogen ions
(
2012
)
Puttaraksa, Nitipon; et al.
;
A1
Ordering effects in extreme high-resolution depth profiling with MeV ion beams
(
2012
)
Whitlow, Harry; et al.
;
A1
Analytical use of ion accelerators in chemistry
(
2011
)
Whitlow, Harry
;
A4
Depth profiling of Al2O3+ TiO2 nanolaminates by means of a time-of-flight energy spectromete
(
2011
)
Laitinen, Mikko; et al.
;
A1
;
OA
Last updated on 2019-11-11 at 09:15