Jaakko Julin
Henkilökunnan yhteystiedot saatavilla yliopiston yhteystietohausta.
ORCID-linkki: http://orcid.org/0000-0003-4376-891X
Aktiiviset JYU-affiliaatiot
- Fysiikan laitos, Tutkijatohtori
Julkaisut
1/2
- Correlated effects of fluorine and hydrogen in fluorinated tin oxide (FTO) transparent electrodes deposited by sputtering at room temperature (2021) Morán-Pedroso, María; et al.; A1
- Bandgap lowering in mixed alloys of Cs2Ag(SbxBi1−x)Br6 double perovskite thin films (2020) Li, Zewei; et al.; A1; OA
- Experimental evidence on photo-assisted O− ion production from Al2O3 cathode in cesium sputter negative ion source (2020) Tarvainen, O.; et al.; A1; OA
- Kinetics of Bulk Lifetime Degradation in Float‐Zone (FZ) Silico n : Fast Activation and Annihilation of Grown‐In Defects and the Role of Hydrogen vs Light (2020) Hiller, Daniel; et al.; A1; OA
- Reaction Pathways for Atomic Layer Deposition with Lithium Hexamethyl Disilazide, Trimethyl Phosphate, and Oxygen Plasma (2020) Werbrouck, Andreas; et al.; A1
- Silicon Surface Passivation by ALD-Ga2O3 : Thermal vs. Plasma-Enhanced Atomic Layer Deposition (2020) Hiller, Danie; et al.; A1
- Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films (2018) Sippola, Perttu; et al.; A1; OA
- Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition : Growth and mechanical properties (2017) Ylivaara, Oili M. E.; et al.; A1; OA
- Conceptual study of a heavy-ion-ERDA spectrometer for energies below 6 MeV (2017) Julin, Jaakko; et al.; A1
- Energy loss and straggling of MeV Si ions in gases (2017) Vockenhuber, C.; et al.; A1; OA
- Room-temperature plasma-enhanced atomic layer deposition of ZnO : Film growth dependence on the PEALD reactor configuration (2017) Napari, Mari; et al.; A1; OA
- The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2–N2 capacitive discharges (2017) Napari, Mari; et al.; A1; OA
- Broadband Ultrahigh-Resolution Spectroscopy of Particle-Induced X Rays : Extending the Limits of Nondestructive Analysis (2016) Palosaari, Mikko; et al.; A1; OA
- Digitizing data acquisition and time-of-flight pulse processing for ToF-ERDA (2016) Julin, Jaakko; et al.; A1; OA
- Instrumentation for time-of-flight elastic recoil detection analysis (2016) Julin, Jaakko; G5; OA
- Simulations on time-of-flight ERDA spectrometer performance (2016) Julin, Jaakko; et al.; A1; OA
- Unusual stoichiometry control in the atomic layer deposition of manganese borate films from manganese bis(tris(pyrazolyl)borate) and ozone (2016) Klesko, Joseph P.; et al.; A1; OA
- Nanotribological, nanomechanical and interfacial characterization of atomic layer deposited TiO2 on a silicon substrate (2015) Lyytinen, Jussi; et al.; A1
- Nucleation and growth of ZnO on PMMA by low-temperature atomic layer deposition (2015) Napari, Mari; et al.; A1; OA
- Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion (2014) Ylivaara, Oili M.E.; et al.; A1
