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Jaakko Julin

Henkilökunnan yhteystiedot saatavilla yliopiston yhteystietohausta.

ORCID-linkki: https://orcid.org/0000-0003-4376-891X

Aktiiviset JYU-affiliaatiot

Fysiikan laitos, Tutkijatohtori

Julkaisut

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Correlated effects of fluorine and hydrogen in fluorinated tin oxide (FTO) transparent electrodes deposited by sputtering at room temperature (2021) Morán-Pedroso, María; et al.; A1
Evolution of the microstructure of sputter deposited TaAlON thin films with increasing oxygen partial pressure (2021) Schalk, Nina; et al.; A1; OA
Measurement of the H2(p,γ)He3 S factor at 265–1094 keV (2021) Turkat, S.; et al.; A1; OA
Mechanical and optical properties of as-grown and thermally annealed titanium dioxide from titanium tetrachloride and water by atomic layer deposition (2021) Ylivaara, Oili M.E.; et al.; A1; OA
Bandgap lowering in mixed alloys of Cs2Ag(SbxBi1−x)Br6 double perovskite thin films (2020) Li, Zewei; et al.; A1; OA
Experimental evidence on photo-assisted O− ion production from Al2O3 cathode in cesium sputter negative ion source (2020) Tarvainen, O.; et al.; A1; OA
Kinetics of Bulk Lifetime Degradation in Float‐Zone (FZ) Silico n : Fast Activation and Annihilation of Grown‐In Defects and the Role of Hydrogen vs Light (2020) Hiller, Daniel; et al.; A1; OA
Reaction Pathways for Atomic Layer Deposition with Lithium Hexamethyl Disilazide, Trimethyl Phosphate, and Oxygen Plasma (2020) Werbrouck, Andreas; et al.; A1
Silicon Surface Passivation by ALD-Ga2O3 : Thermal vs. Plasma-Enhanced Atomic Layer Deposition (2020) Hiller, Danie; et al.; A1
Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films (2018) Sippola, Perttu; et al.; A1; OA
Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition : Growth and mechanical properties (2017) Ylivaara, Oili M. E.; et al.; A1; OA
Conceptual study of a heavy-ion-ERDA spectrometer for energies below 6 MeV (2017) Julin, Jaakko; et al.; A1
Energy loss and straggling of MeV Si ions in gases (2017) Vockenhuber, C.; et al.; A1; OA
Room-temperature plasma-enhanced atomic layer deposition of ZnO : Film growth dependence on the PEALD reactor configuration (2017) Napari, Mari; et al.; A1; OA
The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2–N2 capacitive discharges (2017) Napari, Mari; et al.; A1; OA
Broadband Ultrahigh-Resolution Spectroscopy of Particle-Induced X Rays : Extending the Limits of Nondestructive Analysis (2016) Palosaari, Mikko; et al.; A1; OA
Digitizing data acquisition and time-of-flight pulse processing for ToF-ERDA (2016) Julin, Jaakko; et al.; A1; OA
Instrumentation for time-of-flight elastic recoil detection analysis (2016) Julin, Jaakko; G5; OA
Simulations on time-of-flight ERDA spectrometer performance (2016) Julin, Jaakko; et al.; A1; OA
Unusual stoichiometry control in the atomic layer deposition of manganese borate films from manganese bis(tris(pyrazolyl)borate) and ozone (2016) Klesko, Joseph P.; et al.; A1; OA