H1 Granted patent

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Method for patterning a piece of carbon nanomaterial and a processed piece of carbon nanomaterial (2019)
Menetelmä hiilinanomateriaalikappaleen kuvioimiseksi sekä prosessoitu hiilinanomateriaalikappale


Pettersson, M., Johansson, A., Aumanen, J., Myllyperkiö, P., & Koivistoinen, J. (2019). Method for patterning a piece of carbon nanomaterial and a processed piece of carbon nanomaterial. https://patents.justia.com/patent/10475651


JYU authors or editors


Publication details

All authors or editorsPettersson, Mika; Johansson, Andreas; Aumanen, Jukka; Myllyperkiö, Pasi; Koivistoinen, Juha

Publication year2019

Publication date12/11/2019

Publication countryUnited States

Publication languageEnglish

Persistent website addresshttps://patents.justia.com/patent/10475651

Publication open accessOpenly available

Publication channel open accessOpen Access channel

Web address where publication is availablehttps://patentscope.wipo.int/search/en/detail.jsf?docId=WO2015170005

Additional informationThis application is a U.S national application of PCT-application PCT/FI2015/050298 filed on May 4, 2015 and claiming priority of Finnish national application number FI 20145408 filed on May 5, 2014, the contents of all of which are incorporated herein by reference. - Related patent documents: FI20145408 (Finland); EP3140870 (European Patent Office); US20170207391 (USA); KR1020170008214 (South Korea); ES2784248 (Spain). Granted also in United Kingdom, Germany and Austria. Family reference TP110631.


Abstract

A method for patterning a piece of carbon nanomaterial. The method comprises generating a first light pulse sequence with first light pulse sequence property values, the first light pulse sequence comprising at least one light pulse and exposing a first area of the piece of carbon nanomaterial to said first light pulse sequence in a first process environment having a first oxygen content, without exposing at least part of the piece of carbon nanomaterial to said first light pulse sequence. In this way, the method comprises oxidizing locally, in the first area, at least some carbon atoms of the piece of carbon nanomaterial in such a way that at most 10% of the carbon atoms of the first area are removed from the first area; thereby patterning the first area of the piece of carbon nanomaterial. In addition a processed piece of carbon nanomaterial.


Keywordsnanotechnologypatents

Free keywordshiilinanomateriaali


Contributing organizations


Ministry reportingYes


Last updated on 2024-11-03 at 14:30