A1 Journal article (refereed)
Area‐Selective Atomic Layer Deposition on Functionalized Graphene Prepared by Reversible Laser Oxidation (2022)

Mentel, K. K., Emelianov, A. V., Philip, A., Johansson, A., Karppinen, M., & Pettersson, M. (2022). Area‐Selective Atomic Layer Deposition on Functionalized Graphene Prepared by Reversible Laser Oxidation. Advanced Materials Interfaces, 9(29), Article 2201110. https://doi.org/10.1002/admi.202201110

JYU authors or editors

Mentel, Kamila
Emelianov, Aleksei
Johansson, Andreas
Pettersson, Mika

Publication details

All authors or editors: Mentel, Kamila K.; Emelianov, Aleksei V.; Philip, Anish; Johansson, Andreas; Karppinen, Maarit; Pettersson, Mika

Journal or series: Advanced Materials Interfaces

eISSN: 2196-7350

Publication year: 2022

Publication date: 03/09/2022

Volume: 9

Issue number: 29

Article number: 2201110

Publisher: Wiley

Publication country: Germany

Publication language: English

DOI: https://doi.org/10.1002/admi.202201110

Publication open access: Openly available

Publication channel open access: Partially open access channel

Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/83243

Abstract

Area-selective atomic layer deposition (ALD) is a promising “bottom-up” alternative to current nanopatterning techniques. While it has been successfully implemented in traditional microelectronic processes, selective nucleation of ALD on 2D materials has so far remained an unsolved challenge. In this article, a precise control of the selective deposition of ZnO on graphene at low temperatures (<250 °C) is demonstrated. Maskless femtosecond laser writing is used to locally activate predefined surface areas (down to 300 nm) by functionalizing graphene to achieve excellent ALD selectivity (up to 100%) in these regions for 6-nm-thick ZnO films. The intrinsic conductive properties of graphene can be restored by thermal annealing at low temperature (300 °C) without destroying the deposited ZnO patterns. As the graphene layer can be transferred onto other material surfaces, the present patterning technique opens new attractive ways for various applications in which the functionalized graphene is utilized as a template layer for selective deposition of desired materials.

Keywords: nanotechnology; nanostructures; atomic layer deposition; graphene

Free keywords: Area-selective atomic layer deposition; nanopatterning

Fields of science: