A1 Journal article (refereed)
Area‐Selective Atomic Layer Deposition on Functionalized Graphene Prepared by Reversible Laser Oxidation (2022)

Mentel, K. K., Emelianov, A. V., Philip, A., Johansson, A., Karppinen, M., & Pettersson, M. (2022). Area‐Selective Atomic Layer Deposition on Functionalized Graphene Prepared by Reversible Laser Oxidation. Advanced Materials Interfaces, 9(29), Article 2201110. https://doi.org/10.1002/admi.202201110

JYU authors or editors

Publication details

All authors or editorsMentel, Kamila K.; Emelianov, Aleksei V.; Philip, Anish; Johansson, Andreas; Karppinen, Maarit; Pettersson, Mika

Journal or seriesAdvanced Materials Interfaces


Publication year2022

Publication date03/09/2022


Issue number29

Article number2201110


Publication countryGermany

Publication languageEnglish


Publication open accessOpenly available

Publication channel open accessPartially open access channel

Publication is parallel published (JYX)https://jyx.jyu.fi/handle/123456789/83243


Area-selective atomic layer deposition (ALD) is a promising “bottom-up” alternative to current nanopatterning techniques. While it has been successfully implemented in traditional microelectronic processes, selective nucleation of ALD on 2D materials has so far remained an unsolved challenge. In this article, a precise control of the selective deposition of ZnO on graphene at low temperatures (<250 °C) is demonstrated. Maskless femtosecond laser writing is used to locally activate predefined surface areas (down to 300 nm) by functionalizing graphene to achieve excellent ALD selectivity (up to 100%) in these regions for 6-nm-thick ZnO films. The intrinsic conductive properties of graphene can be restored by thermal annealing at low temperature (300 °C) without destroying the deposited ZnO patterns. As the graphene layer can be transferred onto other material surfaces, the present patterning technique opens new attractive ways for various applications in which the functionalized graphene is utilized as a template layer for selective deposition of desired materials.

Keywordsnanotechnologynanostructuresatomic layer depositiongraphene

Free keywordsArea-selective atomic layer deposition; nanopatterning

Contributing organizations

Related projects

Ministry reportingYes

Reporting Year2022

JUFO rating1

Last updated on 2024-14-06 at 23:46