A1 Journal article (refereed)
Radical-enhanced atomic layer deposition of metallic copper thin films (2005)


Niskanen, A., Rahtu, A., Sajavaara, T., Arstila, K., Ritala, M., & Leskelä, M. (2005). Radical-enhanced atomic layer deposition of metallic copper thin films. Journal of the Electrochemical Society.


JYU authors or editors


Publication details

All authors or editors: Niskanen, A.; Rahtu, A.; Sajavaara, Timo; Arstila, K.; Ritala, M.; Leskelä, M.

Journal or series: Journal of the Electrochemical Society

Publication year: 2005

Publication language: English

Publication open access: Not open

Publication channel open access: 

Additional information: A. Niskanen, A. Rahtu, T. Sajavaara, K. Arstila, M. Ritala, M. Leskelä Radical-enhanced atomic layer deposition of metallic copper thin films Journal of the Electrochemical Society 152 (2005) G25-8


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Ministry reporting: Yes

Preliminary JUFO rating: Not rated


Last updated on 2023-14-12 at 18:39