G4 Doctoral dissertation (monograph)
Nanofabrication by Atomic Force Microscopy, Electron Beam Litography and Reactive Ion Etching (2000)

Lindell, A. (2000). Nanofabrication by Atomic Force Microscopy, Electron Beam Litography and Reactive Ion Etching [Doctoral dissertation]. Jyväskylän yliopisto. JYFL Research Report, 8/2000. http://urn.fi/URN:ISBN:978-951-39-9461-7

JYU authors or editors

Publication details

All authors or editors: Lindell, Anssi

ISBN: 951-39-0770-8

eISBN: 978-951-39-9461-7

Journal or series: JYFL Research Report

ISSN: 0075-465X

Publication year: 2000

Number in series: 8/2000

Publisher: Jyväskylän yliopisto

Place of Publication: Jyväskylä

Publication country: Finland

Publication language: English

Persistent website address: http://urn.fi/URN:ISBN:978-951-39-9461-7

Publication open access: Openly available

Publication channel open access: 

Publication is parallel published (JYX): http://urn.fi/URN:ISBN:978-951-39-9461-7

Abstract

This thesis describes a selection of methods tested and developed for fabrication of nanodevices in the Department of Physics at the University of Jyväskylä during the period 1996-1999. Atomic force microscopy, electron beam lithography and reactive ion etching were the primary methods under investigation, but also bulk micro machined silicon nitride membranes were used as substrates for vertical tunnel junctions and as a basis of a micro calorimeter for investigating thin superconducting disks. These are the main devices fabricated, but the work has also included some aspects of nanofabrication using an atomic force microscope. Suppressing conductance of a thin metallic wire by anodic oxidation and efforts to fabricate planar tunnel junctions by atomic force microscopy will be described.

Contributing organizations

Ministry reporting: Yes

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