A1 Journal article (refereed)
Diffusion of beryllium in Ge and Si-Ge alloys (2008)

Koskelo, O., Pusa, P., Köster, J.Räisänen, & Riihimäki, I. (2008). Diffusion of beryllium in Ge and Si-Ge alloys. J. Appl. Phys. 103 Issue, (7), 073513. https://doi.org/10.1063/1.2903297

JYU authors or editors

Publication details

All authors or editors: Koskelo, O.; Pusa, P.; Köster, J.Räisänen, U.; Riihimäki, Iiro

Journal or series: J. Appl. Phys. 103 Issue

Publication year: 2008

Issue number: 7

Pages range: 073513

Publication language: English

DOI: https://doi.org/10.1063/1.2903297

Publication open access: Not open

Publication channel open access: 

Additional information: O. Koskelo, P. Pusa, J. Räisänen, U. Köster, and I. Riihimäki Diffusion of beryllium in Ge and Si-Ge alloys J. Appl. Phys. 103 Issue 7 (2008) 073513

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Ministry reporting: Yes

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