A1 Journal article (refereed)
Atomic Layer Deposition and Characterization of Erbium Oxide-Doped Zirconium Oxide Thin Films (2010)

Tamm, A., Kemell, M., Kozlova, J., Sajavaara, T., Tallarida, M., Kukli, K., Sammelselg, V., Ritala, M., & Leskelä, M. (2010). Atomic Layer Deposition and Characterization of Erbium Oxide-Doped Zirconium Oxide Thin Films. J. Electrochem. Soc., 157, G193. https://doi.org/10.1149/1.3467843

JYU authors or editors

Publication details

All authors or editors: Tamm, A.; Kemell, M.; Kozlova, J.; Sajavaara, Timo; Tallarida, M.; Kukli, K.; Sammelselg, V.; Ritala, M.; Leskelä, M.

Journal or series: J. Electrochem. Soc.

ISSN: 0013-4651

Publication year: 2010

Volume: 157

Pages range: G193

Publication language: English

DOI: https://doi.org/10.1149/1.3467843

Publication open access: Not open

Publication channel open access: 

Keywords: atomic layer deposition

Contributing organizations

Ministry reporting: Yes

Preliminary JUFO rating: Not rated