A1 Journal article (refereed)
Investigation of ZrO2?Gd2O3 Based High-k Materials as Capacitor Dielectrics (2010)

Jogi, I., Tamm, A., Kukli, K., Kemell, M., Lu, J., Sajavaara, T., Ritala, M., & Leskelä, M. (2010). Investigation of ZrO2?Gd2O3 Based High-k Materials as Capacitor Dielectrics. J. Electrochem. Soc., 157, G202. https://doi.org/10.1149/1.3478117

JYU authors or editors

Publication details

All authors or editors: Jogi, I.; Tamm, A.; Kukli, K.; Kemell, M.; Lu, J.; Sajavaara, Timo; Ritala, M.; Leskelä, M.

Journal or series: J. Electrochem. Soc.

ISSN: 0013-4651

Publication year: 2010

Volume: 157

Pages range: G202

Publication language: English

DOI: https://doi.org/10.1149/1.3478117

Publication open access: Not open

Publication channel open access: 

Keywords: atomic layer deposition

Contributing organizations

Ministry reporting: Yes

Preliminary JUFO rating: Not rated