A1 Journal article (refereed)
Deuterium retention in tungsten co-deposits with neon and argon inclusions (2024)

Tiron, V., Ciolan, M. A., Bulai, G., Burducea, I., Iancu, D., Julin, J., Kivekäs, M., & Costin, C. (2024). Deuterium retention in tungsten co-deposits with neon and argon inclusions. Nuclear Materials and Energy, 39, Article 101656. https://doi.org/10.1016/j.nme.2024.101656

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Publication details

All authors or editors: Tiron, V.; Ciolan, M. A.; Bulai, G.; Burducea, I.; Iancu, D.; Julin, J.; Kivekäs, M.; Costin, C.

Journal or series: Nuclear Materials and Energy

ISSN: 2352-1791

eISSN: 2352-1791

Publication year: 2024

Publication date: 17/04/2024

Volume: 39

Article number: 101656

Publisher: Elsevier

Publication country: Netherlands

Publication language: English

DOI: https://doi.org/10.1016/j.nme.2024.101656

Publication open access: Openly available

Publication channel open access: Open Access channel

Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/94429

Abstract

Deuterium (D) retention in tungsten (W) co-deposited layers, in the presence of neon (Ne) and argon (Ar), was investigated using the bipolar High Power Impulse Magnetron Sputtering (BP-HiPIMS) technique. The deposited layers have a polycrystalline structure, with a preferential growth of W(1 1 0) phase. The concentration of D and noble gases (Ne and Ar) is almost constant throughout the depth of the layers. In a D2-Ar discharge, the deposited layers exhibit compressive stress, indicating that Ar is mostly incorporated into the interstitial sites of the W crystal lattice. D retention increases when Ne is added in the discharge, especially when the deposited layer is bombarded with highly energetic ions. Low energy Ne ions (below the W damaging threshold) induce compressive stress, indicating that Ne atoms occupy interstitial sites in the W crystal lattice. High energy Ne ions induce tensile stress, a sign that Ne is trapped in the grain boundaries as inert-gas-vacancy defects, leading to a grain-boundary relaxation. In the presence of Ne, the ion acceleration towards the layer from 0 V to 300 V results in an increase of the D content of about three times, from 3.2 at.% to 8.6 at.%.

Keywords: tungsten; impurities; plasma physics; plasma technology

Free keywords: deuterium retention; tungsten co-deposition; neon and argon seeding impurities; bipolar HiPIMS

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