A1 Journal article (refereed)
Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen (2012)


Kukli, K., Aarik, J., Aidla, A., Jõgi, I., Arroval, T., Lu, J., Sajavaara, T., Laitinen, M., Kiisler, A.-A., Ritala, M., Leskelä, M., Peck, J., Natwora, J., Geary, J., Spohn, R., Meiere, S., & Thompson, D.M. (2012). Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen. Thin Solid Films, 520, 2756. https://doi.org/10.1016/j.tsf.2011.11.088


JYU authors or editors


Publication details

All authors or editorsKukli, K.; Aarik, J.; Aidla, A.; Jõgi, I.; Arroval, T.; Lu, J.; Sajavaara, Timo; Laitinen, Mikko; Kiisler, A.-A.; Ritala, M.; et al.

Journal or seriesThin Solid Films

ISSN0040-6090

eISSN1879-2731

Publication year2012

Volume520

Pages range2756

PublisherElsevier

Place of PublicationAmsterdam

Publication countryNetherlands

Publication languageEnglish

DOIhttps://doi.org/10.1016/j.tsf.2011.11.088

Publication open accessNot open

Publication channel open access


Keywordsatomic layer deposition

Free keywordsion beam analysis


Contributing organizations


Ministry reportingYes

Reporting Year2012

JUFO rating2


Last updated on 2023-14-12 at 01:43