A1 Journal article (refereed)
Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen (2012)
Kukli, K., Aarik, J., Aidla, A., Jõgi, I., Arroval, T., Lu, J., Sajavaara, T., Laitinen, M., Kiisler, A.-A., Ritala, M., Leskelä, M., Peck, J., Natwora, J., Geary, J., Spohn, R., Meiere, S., & Thompson, D.M. (2012). Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen. Thin Solid Films, 520, 2756. https://doi.org/10.1016/j.tsf.2011.11.088
JYU authors or editors
Publication details
All authors or editors: Kukli, K.; Aarik, J.; Aidla, A.; Jõgi, I.; Arroval, T.; Lu, J.; Sajavaara, Timo; Laitinen, Mikko; Kiisler, A.-A.; Ritala, M.; et al.
Journal or series: Thin Solid Films
ISSN: 0040-6090
eISSN: 1879-2731
Publication year: 2012
Volume: 520
Pages range: 2756
Publisher: Elsevier
Place of Publication: Amsterdam
Publication country: Netherlands
Publication language: English
DOI: https://doi.org/10.1016/j.tsf.2011.11.088
Publication open access: Not open
Publication channel open access:
Keywords: atomic layer deposition
Free keywords: ion beam analysis
Contributing organizations
Ministry reporting: Yes
Reporting Year: 2012
JUFO rating: 2