A4 Article in conference proceedings
RBS and PIXE analysis of chlorine contamination in ALD-Grown TiN films on silicon (2013)


Meersschaut, J., Käyhkö, M., Lenka, H.P., Witters, T., Zhao, Q., Vantomme, A., & Vandervorst, W. (2013). RBS and PIXE analysis of chlorine contamination in ALD-Grown TiN films on silicon. In Application of accelerators in research and industry: Twenty-Second International Conference (pp. 190-194). American Institute of Physics. AIP Conference Proceedings, 1525. https://doi.org/10.1063/1.4802317


JYU authors or editors


Publication details

All authors or editors: Meersschaut, J.; Käyhkö, Marko; Lenka, H.P.; Witters, T.; Zhao, Q.; Vantomme, A.; Vandervorst, W.

Parent publication: Application of accelerators in research and industry: Twenty-Second International Conference

ISBN: 978-0-7354-1148-7

Journal or series: AIP Conference Proceedings

ISSN: 0094-243X

eISSN: 1935-0465

Publication year: 2013

Number in series: 1525

Pages range: 190-194

Publisher: American Institute of Physics

Place of Publication: College Park, MD

Publication country: United States

Publication language: English

DOI: https://doi.org/10.1063/1.4802317

Publication open access: Not open

Publication channel open access: 


Keywords: atomic layer deposition; thin films

Free keywords: Rutherford backscattering; titanium compounds; X-ray emission spectra


Contributing organizations

Other organizations:


Ministry reporting: Yes

Reporting Year: 2013

JUFO rating: 1


Last updated on 2023-14-12 at 03:31