A1 Journal article (refereed)
Normal-Metal–Insulator–Superconductor Tunnel Junction With Atomic-Layer-Deposited Titanium Nitride as Superconductor (2015)
Torgovkin, A., Chaudhuri, S., Malm, J., Sajavaara, T., & Maasilta, I. (2015). Normal-Metal–Insulator–Superconductor Tunnel Junction With Atomic-Layer-Deposited Titanium Nitride as Superconductor. IEEE Transactions on Applied Superconductivity, 25(3), Article 1101604. https://doi.org/10.1109/TASC.2014.2383914
JYU authors or editors
Publication details
All authors or editors: Torgovkin, Andrii; Chaudhuri, Saumyadip; Malm, Jari; Sajavaara, Timo; Maasilta, Ilari
Journal or series: IEEE Transactions on Applied Superconductivity
ISSN: 1051-8223
eISSN: 1558-2515
Publication year: 2015
Volume: 25
Issue number: 3
Article number: 1101604
Publisher: Institute of Electrical and Electronics Engineers
Publication country: United States
Publication language: English
DOI: https://doi.org/10.1109/TASC.2014.2383914
Publication open access: Not open
Publication channel open access:
Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/45757
Keywords: atomic layer deposition; superconductivity
Free keywords: pseudogap; thermometry; thin film; tunnel junctions
Contributing organizations
Ministry reporting: Yes
Reporting Year: 2015
JUFO rating: 1