A1 Journal article (refereed)
Normal-Metal–Insulator–Superconductor Tunnel Junction With Atomic-Layer-Deposited Titanium Nitride as Superconductor (2015)


Torgovkin, A., Chaudhuri, S., Malm, J., Sajavaara, T., & Maasilta, I. (2015). Normal-Metal–Insulator–Superconductor Tunnel Junction With Atomic-Layer-Deposited Titanium Nitride as Superconductor. IEEE Transactions on Applied Superconductivity, 25(3), Article 1101604. https://doi.org/10.1109/TASC.2014.2383914


JYU authors or editors


Publication details

All authors or editors: Torgovkin, Andrii; Chaudhuri, Saumyadip; Malm, Jari; Sajavaara, Timo; Maasilta, Ilari

Journal or series: IEEE Transactions on Applied Superconductivity

ISSN: 1051-8223

eISSN: 1558-2515

Publication year: 2015

Volume: 25

Issue number: 3

Article number: 1101604

Publisher: Institute of Electrical and Electronics Engineers

Publication country: United States

Publication language: English

DOI: https://doi.org/10.1109/TASC.2014.2383914

Publication open access: Not open

Publication channel open access:

Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/45757


Keywords: atomic layer deposition; superconductivity

Free keywords: pseudogap; thermometry; thin film; tunnel junctions


Contributing organizations


Ministry reporting: Yes

Reporting Year: 2015

JUFO rating: 1


Last updated on 2021-24-11 at 11:03