A1 Journal article (refereed)
Ion source research and development at University of Jyväskylä: Studies of different plasma processes and towards the higher beam intensities (2016)

Koivisto, H., Kalvas, T., Tarvainen, O., Komppula, J., Laulainen, J., Kronholm, R., Ranttila, K., Tuunanen, J., Thuillier, T., Xie, D., & Machicoane, G. (2016). Ion source research and development at University of Jyväskylä: Studies of different plasma processes and towards the higher beam intensities. Review of Scientific Instruments, 87(2), Article 02A725. https://doi.org/10.1063/1.4934687

JYU authors or editors

Publication details

All authors or editors: Koivisto, Hannu; Kalvas, Taneli; Tarvainen, Olli; Komppula, Jani; Laulainen, Janne; Kronholm, Risto; Ranttila, Kimmo; Tuunanen, Juha; Thuillier, T.; Xie, D.; et al.

Journal or series: Review of Scientific Instruments

ISSN: 0034-6748

eISSN: 1089-7623

Publication year: 2016

Volume: 87

Issue number: 2

Article number: 02A725

Publisher: American Institute of Physics

Publication country: United States

Publication language: English

DOI: https://doi.org/10.1063/1.4934687

Publication open access: Not open

Publication channel open access: 

Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/50087

Additional information: Contributed paper, published as part of the Proceedings of the 16th International Conference on Ion Sources, New York, New York, USA, August 2015.

Free keywords: electron cyclotron resonance ion sources; plasma diagnostics; beam intensity

Contributing organizations

Ministry reporting: Yes

Reporting Year: 2016

JUFO rating: 1