A1 Journal article (refereed)
Ion source research and development at University of Jyväskylä: Studies of different plasma processes and towards the higher beam intensities (2016)
Koivisto, H., Kalvas, T., Tarvainen, O., Komppula, J., Laulainen, J., Kronholm, R., Ranttila, K., Tuunanen, J., Thuillier, T., Xie, D., & Machicoane, G. (2016). Ion source research and development at University of Jyväskylä: Studies of different plasma processes and towards the higher beam intensities. Review of Scientific Instruments, 87(2), Article 02A725. https://doi.org/10.1063/1.4934687
JYU authors or editors
Publication details
All authors or editors: Koivisto, Hannu; Kalvas, Taneli; Tarvainen, Olli; Komppula, Jani; Laulainen, Janne; Kronholm, Risto; Ranttila, Kimmo; Tuunanen, Juha; Thuillier, T.; Xie, D.; et al.
Journal or series: Review of Scientific Instruments
ISSN: 0034-6748
eISSN: 1089-7623
Publication year: 2016
Volume: 87
Issue number: 2
Article number: 02A725
Publisher: American Institute of Physics
Publication country: United States
Publication language: English
DOI: https://doi.org/10.1063/1.4934687
Publication open access: Not open
Publication channel open access:
Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/50087
Additional information: Contributed paper, published as part of the Proceedings of the 16th International Conference on Ion Sources, New York, New York, USA, August 2015.
Free keywords: electron cyclotron resonance ion sources; plasma diagnostics; beam intensity
Contributing organizations
Ministry reporting: Yes
Reporting Year: 2016
JUFO rating: 1