A1 Journal article (refereed)
Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon (2016)

Kilpi, L., Ylivaara, O. M. E., Vaajoki, A., Malm, J., Sintonen, S., Tuominen, M., Puurunen, R. L., & Ronkainen, H. (2016). Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon. Journal of Vacuum Science and Technology A, 34(1), Article 01A124. https://doi.org/10.1116/1.4935959

JYU authors or editors

Publication details

All authors or editors: Kilpi, Lauri; Ylivaara, Oili M. E.; Vaajoki, Antti; Malm, Jari; Sintonen, Sakari; Tuominen, Marko; Puurunen, Riikka L.; Ronkainen, Helena

Journal or series: Journal of Vacuum Science and Technology A

ISSN: 0734-2101

eISSN: 1520-8559

Publication year: 2016

Volume: 34

Issue number: 1

Article number: 01A124

Publisher: American Institute of Physics

Publication country: United States

Publication language: English

DOI: https://doi.org/10.1116/1.4935959

Publication open access: Not open

Publication channel open access: 

Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/50232

Keywords: thin films; atomic layer deposition; adhesion; silicon

Free keywords: scratch test

Contributing organizations

Ministry reporting: Yes

Reporting Year: 2016

JUFO rating: 1