A1 Journal article (refereed)
Very strong −N–X+⋯−O–N+ halogen bonds (2016)

Puttreddy, R., Jurcek, O., Bhowmik, S., Mäkelä, T., & Rissanen, K. (2016). Very strong −N–X+⋯−O–N+ halogen bonds. Chemical Communications, 52(11), 2338-2341. https://doi.org/10.1039/C5CC09487A

JYU authors or editors

Publication details

All authors or editors: Puttreddy, Rakesh; Jurcek, Ondrej; Bhowmik, Sandip; Mäkelä, Toni; Rissanen, Kari

Journal or series: Chemical Communications

ISSN: 1359-7345

eISSN: 1364-548X

Publication year: 2016

Volume: 52

Issue number: 11

Pages range: 2338-2341

Publisher: RSC Publications

Place of Publication: Cambridge

Publication country: United Kingdom

Publication language: English

DOI: https://doi.org/10.1039/C5CC09487A

Publication open access: Not open

Publication channel open access:

Additional information: Communication-osio.

Abstract

A new −N–X+⋯−O–N+ paradigm for halogen bonding is established by using an oxygen atom as an unusual halogen bond acceptor. The strategy yielded extremely strong halogen bonded complexes with very high association constants characterized in either CDCl3 or acetone-d6 solution by 1H NMR titrations and in the solid-state by single crystal X-ray analysis. The obtained halogen bond interactions, RXB, in the solid-state are found to be in the order of strong hydrogen bonds, viz. RXB ≈ RHB.

Keywords: organic chemistry; supramolecular chemistry; chemical bonds

Free keywords: halogen bonds; oxygen atom

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Ministry reporting: Yes

Reporting Year: 2016

JUFO rating: 2