A1 Journal article (refereed)
Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films (2016)

Broas, M., Sippola, P., Sajavaara, T., Vuorinen, V., Perros, A. P., Lipsanen, H., & Paulasto-Kröckel, M. (2016). Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films. Journal of Vacuum Science and Technology A, 34(4), Article 041506. https://doi.org/10.1116/1.4953029

JYU authors or editors

Sajavaara, Timo

Publication details

All authors or editors: Broas, Mikael; Sippola, Perttu; Sajavaara, Timo; Vuorinen, Vesa; Perros, Alexander Pyymaki; Lipsanen, Harri; Paulasto-Kröckel, Mervi

Journal or series: Journal of Vacuum Science and Technology A

ISSN: 0734-2101

eISSN: 1520-8559

Publication year: 2016

Volume: 34

Issue number: 4

Article number: 041506

Publisher: American Institute of Physics

Publication country: United States

Publication language: English

DOI: https://doi.org/10.1116/1.4953029

Publication open access: Not open