A2 Review article, Literature review, Systematic review
Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD” (2017)
Ahvenniemi, E., Akbashev, A. R., Ali, S., Bechelany, M., Berdova, M., Boyadjiev, S., . . . Yurkevich, O. (2017). Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”. Journal of Vacuum Science and Technology A, 35 (1), 010801. doi:10.1116/1.4971389
JYU authors or editors
Publication details
All authors or editors: Ahvenniemi, Esko; Akbashev, Andrew R.; Ali, Saima; Bechelany, Mikhael; Berdova, Maria; Boyadjiev, Stefan; Cameron, David C.; Chen, Rong; Chubarov, Mikhail; Cremers, Veronique; et al.
Journal or series: Journal of Vacuum Science and Technology A
ISSN: 0734-2101
Publication year: 2017
Volume: 35
Issue number: 1
Article number: 010801
Publisher: AIP Publishing
Publication country: United States
Publication language: English
DOI: https://doi.org/10.1116/1.4971389
Open Access: Open access publication published in a hybrid channel
Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/52742
Keywords: atomic layer deposition
Free keywords: semiconductor manufacturing; history of technology
Contributing organizations
- Aalto University
- ASELSAN Inc.
- Center for Materials and Microsystems, Fondazione Bruno Kessler
- Delft University of Technology
- Eindhoven University of Technology
- Fraunhofer Institute for Ceramic Technologies and Systems IKTS
- Ghent University
- GlobalFoundries, USA
- Grenoble Alpes University
- Huazhong University of Science and Technology
Ministry reporting: Yes
Reporting Year: 2017
JUFO rating: 1
