A1 Journal article (refereed)
Room-temperature plasma-enhanced atomic layer deposition of ZnO : Film growth dependence on the PEALD reactor configuration (2017)


Napari, M., Lahtinen, M., Veselov, A., Julin, J., Østreng, E., & Sajavaara, T. (2017). Room-temperature plasma-enhanced atomic layer deposition of ZnO : Film growth dependence on the PEALD reactor configuration. Surface and Coatings Technology, 326(Part A, October), 281-290. https://doi.org/10.1016/j.surfcoat.2017.07.056


JYU authors or editors


Publication details

All authors or editors: Napari, Mari; Lahtinen, Manu; Veselov, Alexey; Julin, Jaakko; Østreng, Erik; Sajavaara, Timo

Journal or series: Surface and Coatings Technology

ISSN: 0257-8972

eISSN: 1879-3347

Publication year: 2017

Volume: 326

Issue number: Part A, October

Pages range: 281-290

Publisher: Elsevier Sequoia

Publication country: Switzerland

Publication language: English

DOI: https://doi.org/10.1016/j.surfcoat.2017.07.056

Publication open access: Not open

Publication channel open access: 

Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/55011


Keywords: zinc oxide

Free keywords: plasma-enhanced atomic layer deposition; inductively-coupled plasma; capacitively-coupled plasma


Contributing organizations

Other organizations:


Ministry reporting: Yes

Reporting Year: 2017

JUFO rating: 1


Last updated on 2024-08-01 at 15:56