A1 Journal article (refereed)
Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films (2017)

Broas, M., Jiang, H., Graff, A., Sajavaara, T., Vuorinen, V., & Paulasto-Kröckel, M. (2017). Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films. Applied Physics Letters, 111(14), Article 141606. https://doi.org/10.1063/1.4994974

JYU authors or editors

Publication details

All authors or editors: Broas, Mikael; Jiang, Hua; Graff, Andreas; Sajavaara, Timo; Vuorinen, Vesa; Paulasto-Kröckel, Mervi

Journal or series: Applied Physics Letters

ISSN: 0003-6951

eISSN: 1077-3118

Publication year: 2017

Volume: 111

Issue number: 14

Article number: 141606

Publisher: AIP Publishing LLC

Publication country: United States

Publication language: English

DOI: https://doi.org/10.1063/1.4994974

Publication open access: Not open

Publication channel open access: 

Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/55615

Keywords: dermatology; ceramics; microscopy; thin films

Free keywords: piezoelectric films

Contributing organizations

Ministry reporting: Yes

Reporting Year: 2017

JUFO rating: 2