A1 Journal article (refereed)
Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films (2017)
Broas, M., Jiang, H., Graff, A., Sajavaara, T., Vuorinen, V., & Paulasto-Kröckel, M. (2017). Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films. Applied Physics Letters, 111(14), Article 141606. https://doi.org/10.1063/1.4994974
JYU authors or editors
Publication details
All authors or editors: Broas, Mikael; Jiang, Hua; Graff, Andreas; Sajavaara, Timo; Vuorinen, Vesa; Paulasto-Kröckel, Mervi
Journal or series: Applied Physics Letters
ISSN: 0003-6951
eISSN: 1077-3118
Publication year: 2017
Volume: 111
Issue number: 14
Article number: 141606
Publisher: AIP Publishing LLC
Publication country: United States
Publication language: English
DOI: https://doi.org/10.1063/1.4994974
Publication open access: Not open
Publication channel open access:
Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/55615
Keywords: dermatology; ceramics; microscopy; thin films
Free keywords: piezoelectric films
Contributing organizations
Ministry reporting: Yes
Reporting Year: 2017
JUFO rating: 2