A1 Journal article (refereed)
Low-temperature atomic layer deposition of SiO2/Al2O3 multilayer structures constructed on self-standing films of cellulose nanofibrils (2018)

Putkonen, M., Sippola, P., Svärd, L., Sajavaara, T., Vartiainen, J., Buchanan, I., Forsström, U., Simell, P., & Tammelin, T. (2018). Low-temperature atomic layer deposition of SiO2/Al2O3 multilayer structures constructed on self-standing films of cellulose nanofibrils. Philosophical Transactions of the Royal Society A : Mathematical Physical and Engineering Sciences, 376(2112), Article 20170037. https://doi.org/10.1098/rsta.2017.0037

JYU authors or editors

Publication details

All authors or editors: Putkonen, Matti; Sippola, Perttu; Svärd, Laura; Sajavaara, Timo; Vartiainen, Jari; Buchanan, Iain; Forsström, Ulla; Simell, Pekka; Tammelin, Tekla

Journal or series: Philosophical Transactions of the Royal Society A : Mathematical Physical and Engineering Sciences

ISSN: 1364-503X

eISSN: 1471-2962

Publication year: 2018

Volume: 376

Issue number: 2112

Article number: 20170037

Publisher: Royal Society Publishing

Publication country: United Kingdom

Publication language: English

DOI: https://doi.org/10.1098/rsta.2017.0037

Publication open access: Not open

Publication channel open access: 

Keywords: nanostructures; thin films

Free keywords: low-temperature atomic layer deposition; SiO2; hybrid multilayers; cellulose nanofibrils; water sensitivity; diffusion barrier

Contributing organizations

Ministry reporting: Yes

Reporting Year: 2018

JUFO rating: 2