A1 Journal article (refereed)
Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma (2018)
Rontu, V., Sippola, P., Broas, M., Ross, G., Sajavaara, T., Lipsanen, H., Paulasto-Kröckel, M., & Franssila, S. (2018). Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma. Journal of Vacuum Science and Technology A, 36(2), Article 021508. https://doi.org/10.1116/1.5003381
JYU authors or editors
Publication details
All authors or editors: Rontu, Ville; Sippola, Perttu; Broas, Mikael; Ross, Glenn; Sajavaara, Timo; Lipsanen, Harri; Paulasto-Kröckel, Mervi; Franssila, Sami
Journal or series: Journal of Vacuum Science and Technology A
ISSN: 0734-2101
eISSN: 1520-8559
Publication year: 2018
Volume: 36
Issue number: 2
Article number: 021508
Publisher: AIP Publishing
Publication country: United States
Publication language: English
DOI: https://doi.org/10.1116/1.5003381
Publication open access: Not open
Publication channel open access:
Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/56914
Keywords: atomic layer deposition; optical properties; dermatology
Free keywords: crystal structure; piezoelectric films
Contributing organizations
Ministry reporting: Yes
Reporting Year: 2018
JUFO rating: 1