A1 Journal article (refereed)
Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma (2018)


Rontu, V., Sippola, P., Broas, M., Ross, G., Sajavaara, T., Lipsanen, H., Paulasto-Kröckel, M., & Franssila, S. (2018). Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma. Journal of Vacuum Science and Technology A, 36(2), Article 021508. https://doi.org/10.1116/1.5003381


JYU authors or editors


Publication details

All authors or editors: Rontu, Ville; Sippola, Perttu; Broas, Mikael; Ross, Glenn; Sajavaara, Timo; Lipsanen, Harri; Paulasto-Kröckel, Mervi; Franssila, Sami

Journal or series: Journal of Vacuum Science and Technology A

ISSN: 0734-2101

eISSN: 1520-8559

Publication year: 2018

Volume: 36

Issue number: 2

Article number: 021508

Publisher: AIP Publishing

Publication country: United States

Publication language: English

DOI: https://doi.org/10.1116/1.5003381

Publication open access: Not open

Publication channel open access:

Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/56914


Keywords: atomic layer deposition; optical properties; dermatology

Free keywords: crystal structure; piezoelectric films


Contributing organizations

Other organizations:


Ministry reporting: Yes

Reporting Year: 2018

JUFO rating: 1


Last updated on 2021-09-08 at 13:00