A1 Journal article (refereed)
In-situ annealing characterization of atomic-layer-deposited Al2O3 in N2, H2 and vacuum atmospheres (2019)


Broas, M., Lemettinen, J., Sajavaara, T., Tilli, M., Vuorinen, V., Suihkonen, S., & Paulasto-Kröckel, M. (2019). In-situ annealing characterization of atomic-layer-deposited Al2O3 in N2, H2 and vacuum atmospheres. Thin Solid Films, 682, 147-155. https://doi.org/10.1016/j.tsf.2019.03.010


JYU authors or editors


Publication details

All authors or editorsBroas, Mikael; Lemettinen, Jori; Sajavaara, Timo; Tilli, Markku; Vuorinen, Vesa; Suihkonen, Sami; Paulasto-Kröckel, Mervi

Journal or seriesThin Solid Films

ISSN0040-6090

eISSN1879-2731

Publication year2019

Volume682

Issue number0

Pages range147-155

PublisherElsevier BV

Publication countryNetherlands

Publication languageEnglish

DOIhttps://doi.org/10.1016/j.tsf.2019.03.010

Publication open accessNot open

Publication channel open access

Publication is parallel published (JYX)https://jyx.jyu.fi/handle/123456789/64285


Keywordsatomic layer depositionthin filmsaluminum oxide

Free keywordsbarrier film; high-temperature annealing; crystallization


Contributing organizations

Other organizations:


Ministry reportingYes

Reporting Year2019

JUFO rating1


Last updated on 2024-11-05 at 20:46