A1 Journal article (refereed)
In-situ annealing characterization of atomic-layer-deposited Al2O3 in N2, H2 and vacuum atmospheres (2019)
Broas, M., Lemettinen, J., Sajavaara, T., Tilli, M., Vuorinen, V., Suihkonen, S., & Paulasto-Kröckel, M. (2019). In-situ annealing characterization of atomic-layer-deposited Al2O3 in N2, H2 and vacuum atmospheres. Thin Solid Films, 682, 147-155. https://doi.org/10.1016/j.tsf.2019.03.010
JYU authors or editors
Publication details
All authors or editors: Broas, Mikael; Lemettinen, Jori; Sajavaara, Timo; Tilli, Markku; Vuorinen, Vesa; Suihkonen, Sami; Paulasto-Kröckel, Mervi
Journal or series: Thin Solid Films
ISSN: 0040-6090
eISSN: 1879-2731
Publication year: 2019
Volume: 682
Issue number: 0
Pages range: 147-155
Publisher: Elsevier BV
Publication country: Netherlands
Publication language: English
DOI: https://doi.org/10.1016/j.tsf.2019.03.010
Publication open access: Not open
Publication channel open access:
Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/64285
Keywords: atomic layer deposition; thin films; aluminum oxide
Free keywords: barrier film; high-temperature annealing; crystallization
Contributing organizations
Ministry reporting: Yes
VIRTA submission year: 2019
JUFO rating: 1