A1 Journal article (refereed)
In-situ annealing characterization of atomic-layer-deposited Al2O3 in N2, H2 and vacuum atmospheres (2019)

Broas, M., Lemettinen, J., Sajavaara, T., Tilli, M., Vuorinen, V., Suihkonen, S., & Paulasto-Kröckel, M. (2019). In-situ annealing characterization of atomic-layer-deposited Al2O3 in N2, H2 and vacuum atmospheres. Thin Solid Films, 682, 147-155. https://doi.org/10.1016/j.tsf.2019.03.010

JYU authors or editors

Publication details

All authors or editors: Broas, Mikael; Lemettinen, Jori; Sajavaara, Timo; Tilli, Markku; Vuorinen, Vesa; Suihkonen, Sami; Paulasto-Kröckel, Mervi

Journal or series: Thin Solid Films

ISSN: 0040-6090

eISSN: 1879-2731

Publication year: 2019

Volume: 682

Issue number: 0

Pages range: 147-155

Publisher: Elsevier BV

Publication country: Netherlands

Publication language: English

DOI: https://doi.org/10.1016/j.tsf.2019.03.010

Publication open access: Not open

Publication channel open access:

Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/64285

Keywords: atomic layer deposition; thin films; aluminum oxide

Free keywords: barrier film; high-temperature annealing; crystallization

Contributing organizations

Ministry reporting: Yes

Reporting Year: 2019

JUFO rating: 1