A1 Journal article (refereed)
Niobium nitride thin films for very low temperature resistive thermometry (2019)
Nguyen, T., Tavakoli, A., Triqueneaux, S., Swami, R., Ruhtinas, A., Gradel, J., Garcia-Campos, P., Hasselbach, K., Frydman, A., Piot, B., Gibert, M., Collin, E., & Bourgeois, O. (2019). Niobium nitride thin films for very low temperature resistive thermometry. Journal of Low Temperature Physics, 197(5-6), 348-356. https://doi.org/10.1007/s10909-019-02222-6
JYU authors or editors
Publication details
All authors or editors: Nguyen, Tuyen; Tavakoli, Adib; Triqueneaux, Sebastien; Swami, Rahul; Ruhtinas, Aki; Gradel, Jeremy; Garcia-Campos, Pablo; Hasselbach, Klaus; Frydman, Aviad; Piot, Benjamin; et al.
Journal or series: Journal of Low Temperature Physics
ISSN: 0022-2291
eISSN: 1573-7357
Publication year: 2019
Volume: 197
Issue number: 5-6
Pages range: 348-356
Publisher: Springer
Publication country: United States
Publication language: English
DOI: https://doi.org/10.1007/s10909-019-02222-6
Publication open access: Not open
Publication channel open access:
Web address of parallel published publication (pre-print): https://arxiv.org/abs/1907.08443
Abstract
We investigate thin-film resistive thermometry based on metal-to-insulator transition (niobium nitride) materials down to very low temperature. The variation of the NbN thermometer resistance has been calibrated versus temperature and magnetic field. High sensitivity in temperature variation detection is demonstrated through efficient temperature coefficient of resistance. The nitrogen content of the niobium nitride thin films can be tuned to adjust the optimal working temperature range. In the present experiment, we show the versatility of the NbN thin-film technology through applications in very different low-temperature use cases. We demonstrate that thin-film resistive thermometry can be extended to temperatures below 30 mK with low electrical impedance.
Keywords: thin films; nanosciences; thermometers; low temperature physics
Free keywords: resistive thermometry; niobium nitride; thin film; nanoscale
Contributing organizations
Ministry reporting: Yes
Reporting Year: 2019
JUFO rating: 1