A1 Journal article (refereed)
Nanofabrication on 2D and 3D Topography via Positive‐Tone Direct‐Write Laser Lithography (2020)

Heiskanen, S., Geng, Z., Mastomäki, J., & Maasilta, I. J. (2020). Nanofabrication on 2D and 3D Topography via Positive‐Tone Direct‐Write Laser Lithography. Advanced Engineering Materials, 22(2), Article 1901290. https://doi.org/10.1002/adem.201901290

JYU authors or editors

Publication details

All authors or editors: Heiskanen, Samuli; Geng, Zhuoran; Mastomäki, Jaakko; Maasilta, Ilari J.

Journal or series: Advanced Engineering Materials

ISSN: 1438-1656

eISSN: 1527-2648

Publication year: 2020

Volume: 22

Issue number: 2

Article number: 1901290

Publisher: Wiley-VCH Verlag

Publication country: Germany

Publication language: English

DOI: https://doi.org/10.1002/adem.201901290

Publication open access: Not open

Publication channel open access:

Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/68006


Direct laser writing (DLW) lithography using two‐photon absorption is a powerful technique mostly used for fabrication of complex structures in micro‐ and nanoscale, by photopolymerizing a negative‐tone resist. In contrast, in this study it is demonstrated that DLW is also well suited for fabricating nano‐ to microscale metallic structures using lift‐off and a positive‐tone photoresist. It is shown first that versatile, fast and large area fabrication is possible on flat two‐dimensional insulating substrates, and an expression for how the line width varies with the scanning speed is derived, with excellent agreement with the experiments. Even more interestingly, a unique application for the DLW lift‐off process is demonstrated, by fabricating sub‐micron scale metallic wiring on uneven substrates with sloping elevation changes as high as 20 µm. Such fabrication is practically impossible with more standard lithographic techniques.

Keywords: nanotechnology; nanostructures; laser technology

Free keywords: direct laser writing; lift‐off nanofabrication; positive‐tone resist; two‐photon absorption

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Related projects

Ministry reporting: Yes

Reporting Year: 2020

JUFO rating: 1

Last updated on 2021-07-07 at 21:36