A1 Journal article (refereed)
Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films (2020)


Napari, Mari; Huq, Tahmida N.; Maity, Tuhin; Gomersall, Daisy; Niang, Kham M.; Barthel, Armin; Thompson, Juliet E.; Kinnunen, Sami; Arstila, Kai; Sajavaara, Timo; Hoye, Robert L. Z. et al. (2020). Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films. InfoMat, 2 (4), 769-774. DOI: 10.1002/inf2.12076


JYU authors or editors


Publication details

All authors or editors: Napari, Mari; Huq, Tahmida N.; Maity, Tuhin; Gomersall, Daisy; Niang, Kham M.; Barthel, Armin; Thompson, Juliet E.; Kinnunen, Sami; Arstila, Kai; Sajavaara, Timo; et al.

Journal or series: InfoMat

eISSN: 2567-3165

Publication year: 2020

Volume: 2

Issue number: 4

Pages range: 769-774

Publisher: John Wiley & Sons

Publication country: Germany

Publication language: English

DOI: http://doi.org/10.1002/inf2.12076

Open Access: Publication published in an open access channel

Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/68402


Keywords: thin films; atomic layer deposition; chemical reactions; chemical phenomena

Free keywords: atomic layer deposition; chemical vapor deposition; nickel oxide; solution deposition; thin films


Contributing organizations


Ministry reporting: Yes

Reporting Year: 2020


Last updated on 2020-09-07 at 23:10