A1 Journal article (refereed)
Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films (2020)


Napari, M., Huq, T. N., Maity, T., Gomersall, D., Niang, K. M., Barthel, A., Thompson, J. E., Kinnunen, S., Arstila, K., Sajavaara, T., Hoye, R. L. Z., Flewitt, A. J., & MacManus-Driscoll, J. L. (2020). Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films. InfoMat, 2(4), 769-774. https://doi.org/10.1002/inf2.12076


JYU authors or editors


Publication details

All authors or editors: Napari, Mari; Huq, Tahmida N.; Maity, Tuhin; Gomersall, Daisy; Niang, Kham M.; Barthel, Armin; Thompson, Juliet E.; Kinnunen, Sami; Arstila, Kai; Sajavaara, Timo; et al.

Journal or series: InfoMat

eISSN: 2567-3165

Publication year: 2020

Volume: 2

Issue number: 4

Pages range: 769-774

Publisher: John Wiley & Sons

Publication country: Germany

Publication language: English

DOI: https://doi.org/10.1002/inf2.12076

Publication open access: Openly available

Publication channel open access: Open Access channel

Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/68402


Keywords: thin films; atomic layer deposition; chemical reactions; chemical phenomena

Free keywords: atomic layer deposition; chemical vapor deposition; nickel oxide; solution deposition; thin films


Contributing organizations


Ministry reporting: Yes

Reporting Year: 2020

JUFO rating: 1


Last updated on 2021-07-07 at 21:31