A1 Journal article (refereed)
Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films (2020)


Napari, M., Huq, T. N., Maity, T., Gomersall, D., Niang, K. M., Barthel, A., Thompson, J. E., Kinnunen, S., Arstila, K., Sajavaara, T., Hoye, R. L. Z., Flewitt, A. J., & MacManus-Driscoll, J. L. (2020). Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films. InfoMat, 2(4), 769-774. https://doi.org/10.1002/inf2.12076


JYU authors or editors


Publication details

All authors or editorsNapari, Mari; Huq, Tahmida N.; Maity, Tuhin; Gomersall, Daisy; Niang, Kham M.; Barthel, Armin; Thompson, Juliet E.; Kinnunen, Sami; Arstila, Kai; Sajavaara, Timo; et al.

Journal or seriesInfoMat

eISSN2567-3165

Publication year2020

Volume2

Issue number4

Pages range769-774

PublisherJohn Wiley & Sons

Publication countryGermany

Publication languageEnglish

DOIhttps://doi.org/10.1002/inf2.12076

Publication open accessOpenly available

Publication channel open accessOpen Access channel

Publication is parallel published (JYX)https://jyx.jyu.fi/handle/123456789/68402


Keywordsthin filmsatomic layer depositionchemical reactionschemical phenomena

Free keywordsatomic layer deposition; chemical vapor deposition; nickel oxide; solution deposition; thin films


Contributing organizations


Ministry reportingYes

VIRTA submission year2020

JUFO rating1


Last updated on 2024-12-10 at 06:15