A1 Journal article (refereed)
Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films (2020)
Napari, M., Huq, T. N., Maity, T., Gomersall, D., Niang, K. M., Barthel, A., Thompson, J. E., Kinnunen, S., Arstila, K., Sajavaara, T., Hoye, R. L. Z., Flewitt, A. J., & MacManus-Driscoll, J. L. (2020). Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films. InfoMat, 2(4), 769-774. https://doi.org/10.1002/inf2.12076
JYU authors or editors
Publication details
All authors or editors: Napari, Mari; Huq, Tahmida N.; Maity, Tuhin; Gomersall, Daisy; Niang, Kham M.; Barthel, Armin; Thompson, Juliet E.; Kinnunen, Sami; Arstila, Kai; Sajavaara, Timo; et al.
Journal or series: InfoMat
eISSN: 2567-3165
Publication year: 2020
Volume: 2
Issue number: 4
Pages range: 769-774
Publisher: John Wiley & Sons
Publication country: Germany
Publication language: English
DOI: https://doi.org/10.1002/inf2.12076
Publication open access: Openly available
Publication channel open access: Open Access channel
Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/68402
Keywords: thin films; atomic layer deposition; chemical reactions; chemical phenomena
Free keywords: atomic layer deposition; chemical vapor deposition; nickel oxide; solution deposition; thin films
Contributing organizations
Ministry reporting: Yes
VIRTA submission year: 2020
JUFO rating: 1