A1 Journal article (refereed)
A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films (2020)
Cao, L., Mattelaer, F., Sajavaara, T., Dendooven, J., & Detavernier, C. (2020). A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films. Journal of Vacuum Science and Technology A, 38(2), Article 022417. https://doi.org/10.1116/1.5139631
JYU authors or editors
Publication details
All authors or editors: Cao, LiAo; Mattelaer, Felix; Sajavaara, Timo; Dendooven, Jolien; Detavernier, Christophe
Journal or series: Journal of Vacuum Science and Technology A
ISSN: 0734-2101
eISSN: 1520-8559
Publication year: 2020
Volume: 38
Issue number: 2
Article number: 022417
Publisher: American Institute of Physics
Publication country: United States
Publication language: English
DOI: https://doi.org/10.1116/1.5139631
Publication open access: Not open
Publication channel open access:
Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/67941
Abstract
For large-scale atomic layer deposition (ALD) of alumina, the most commonly used alkyl precursor trimethylaluminum poses safety issues due to its pyrophoric nature. In this work, the authors have investigated a liquid alkoxide, aluminum tri-sec-butoxide (ATSB), as a precursor for ALD deposition of alumina. ATSB is thermally stable and the liquid nature facilitates handling in a bubbler and potentially enables liquid injection toward upscaling. Both thermal and plasma enhanced ALD processes are investigated in a vacuum type reactor by using water, oxygen plasma, and water plasma as coreactants. All processes achieved ALD deposition at a growth rate of 1–1.4 Å/cycle for substrate temperatures ranging from 100 to 200 °C. Film morphology, surface roughness, and composition have been studied with different characterization techniques.
Keywords: thin films; atomic layer deposition; aluminium
Free keywords: plasma processing; atomic layer deposition
Contributing organizations
Ministry reporting: Yes
Reporting Year: 2020
JUFO rating: 1