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Correlated effects of fluorine and hydrogen in fluorinated tin oxide (FTO) transparent electrodes deposited by sputtering at room temperature (2021)

Morán-Pedroso, M., Gago, R., Julin, J., Salas-Colera, E., Jimenez, I., de Andrés, A., & Prieto, C. (2021). Correlated effects of fluorine and hydrogen in fluorinated tin oxide (FTO) transparent electrodes deposited by sputtering at room temperature. Applied Surface Science, 537, Article 147906. https://doi.org/10.1016/j.apsusc.2020.147906

JYU-tekijät tai -toimittajat

Julkaisun tiedot

Julkaisun kaikki tekijät tai toimittajat: Morán-Pedroso, María; Gago, Raúl; Julin, Jaakko; Salas-Colera, Eduardo; Jimenez, Ignacio; de Andrés, Alicia; Prieto, Carlos

Lehti tai sarja: Applied Surface Science

ISSN: 0169-4332

eISSN: 1873-5584

Julkaisuvuosi: 2021

Volyymi: 537

Artikkelinumero: 147906

Kustantaja: Elsevier BV

Julkaisumaa: Alankomaat

Julkaisun kieli: englanti

DOI: https://doi.org/10.1016/j.apsusc.2020.147906

Julkaisun avoin saatavuus: Ei avoin

Julkaisukanavan avoin saatavuus:


The optical and electrical properties of fluorinated tin oxide (FTO) films deposited at room temperature by sputtering have been investigated varying the fluorine content and the hydrogen atmosphere. The complex behavior of the obtained films is disclosed using a wide set of characterization techniques that reveals the combined effects of these two parameters on the generated defects. These defects control the electrical transport (carrier density, mobility and conductivity), the optical properties (band gap and defects-related absorption and photoluminescence) and finally promote the amorphization of the samples. H2 in the sputtering gas does not modify the H content in the films but induces the partial reduction of tin (from Sn4+ to Sn2+) and the consequent generation of oxygen vacancies with shallow energy levels close to the valence band. A variation of up to four orders of magnitude in electrical conductivity is reported in samples with the appropriate fluorine doping and hydrogen fraction in the sputtering gas, maintaining excellent optical transparency. Optimized room temperature grown electrodes reach sheet resistance ~20 Ω/□ and transparency >90%. This room temperature deposition process enables film preparation on flexible organic substrates, such as polyethylene terephthalate (PET), with identical performance of doubtless interest in flexible and large scale electronics.

YSO-asiasanat: ohutkalvot; optiset ominaisuudet; sähköiset ominaisuudet

Vapaat asiasanat: transparent conductive materials; fluorinated tin oxide; room temperature film preparation

Liittyvät organisaatiot


OKM-raportointi: Kyllä

Raportointivuosi: 2021

Alustava JUFO-taso: 1

Viimeisin päivitys 2022-15-06 klo 15:02