A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
Reaction Pathways for Atomic Layer Deposition with Lithium Hexamethyl Disilazide, Trimethyl Phosphate, and Oxygen Plasma (2020)


Werbrouck, A., Mattelaer, F., Minjauw, M., Nisula, M., Julin, J., Munnik, F., Dendooven, J., & Detavernier, C. (2020). Reaction Pathways for Atomic Layer Deposition with Lithium Hexamethyl Disilazide, Trimethyl Phosphate, and Oxygen Plasma. Journal of Physical Chemistry C, 124(50), 27829-27839. https://doi.org/10.1021/acs.jpcc.0c09284


JYU-tekijät tai -toimittajat


Julkaisun tiedot

Julkaisun kaikki tekijät tai toimittajatWerbrouck, Andreas; Mattelaer, Felix; Minjauw, Matthias; Nisula, Mikko; Julin, Jaakko; Munnik, Frans; Dendooven, Jolien; Detavernier, Christophe

Lehti tai sarjaJournal of Physical Chemistry C

ISSN1932-7447

eISSN1932-7455

Julkaisuvuosi2020

Volyymi124

Lehden numero50

Artikkelin sivunumerot27829-27839

KustantajaAmerican Chemical Society (ACS)

JulkaisumaaYhdysvallat (USA)

Julkaisun kielienglanti

DOIhttps://doi.org/10.1021/acs.jpcc.0c09284

Julkaisun avoin saatavuusEi avoin

Julkaisukanavan avoin saatavuus

Julkaisu on rinnakkaistallennettu (JYX)https://jyx.jyu.fi/handle/123456789/78702


Tiivistelmä

Atomic layer deposition (ALD) of lithium-containing films is of interest for the development of next-generation energy storage devices. Lithium hexamethyl disilazide (LiHMDS) is an established precursor to grow these types of films. The LiHMDS molecule can either be used as a single-source precursor molecule for lithium or as a dual-source precursor molecule for lithium and silicon. Single-source behavior of LiHMDS is observed in the deposition process with trimethylphosphate (TMP) resulting in the deposition of crystalline lithium phosphate (Li3PO4). In contrast, LiHMDS exhibits dual-source behavior when combined with O2 plasma, resulting in a lithium silicate. Both processes were characterized with in situ ellipsometry, in situ time-resolved full-range mass spectrometry, X-ray photoelectron spectroscopy (XPS), and elastic recoil detection analysis (ERDA). When we combined both reactants into a three-step LiHMDS-TMP-O2* or LiHMDS-O2*-TMP process, the dual-source nature of LiHMDS emerged again. By carefully combining our measurements, it is shown that film growth with LiHMDS (in combination with TMP and O2 plasma) is driven by dipole-driven self-saturated surface interactions combined with dissociative chemisorption. We show that when hydroxyl groups are present on the surface, silicon will be incorporated in the films. These insights benefit the general understanding of the behavior of the LiHMDS and TMP precursors and may facilitate their effective use in ternary or quaternary processes.


YSO-asiasanatatomikerroskasvatusohutkalvotlitium


Liittyvät organisaatiot

JYU-yksiköt:


OKM-raportointiKyllä

Raportointivuosi2020

JUFO-taso2


Viimeisin päivitys 2024-22-04 klo 17:41