A1 Journal article (refereed)
Al2O3 ALD films grown using TMA + rare isotope 2H216O and 1H218O precursors (2021)

Kinnunen, S., Arstila, K., & Sajavaara, T. (2021). Al2O3 ALD films grown using TMA + rare isotope 2H216O and 1H218O precursors. Applied Surface Science, 546, Article 148909. https://doi.org/10.1016/j.apsusc.2020.148909

JYU authors or editors

Publication details

All authors or editors: Kinnunen, Sami; Arstila, Kai; Sajavaara, Timo

Journal or series: Applied Surface Science

ISSN: 0169-4332

eISSN: 1873-5584

Publication year: 2021

Volume: 546

Article number: 148909

Publisher: Elsevier

Publication country: Netherlands

Publication language: English

DOI: https://doi.org/10.1016/j.apsusc.2020.148909

Publication open access: Not open

Publication channel open access: 

Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/74224

Abstract

In this work hydrogen and oxygen migration and exchange reactions in the atomic layer deposited (ALD) Al2O3 thin films were studied together with hydrogen incorporation by varying deposition parameters. Al2O3 films deposited at low temperatures can contain more than 20 at. % of hydrogen. Both higher temperature and longer purge length decrease the hydrogen and carbon concentrations significantly. In order to track the hydrogen and oxygen movement in the films, heavy water (2H216O) and oxygen-18 enriched water (1H218O) were used as precursors in combination with trimethylaluminium (TMA). Different isotopes of the same element were quantified by means of time-of-flight elastic recoil detection analysis (ToF-ERDA). It was found out that 1H/2H exchange reactions take place even at room temperature if the hydrogen concentration is high enough. On the other hand, oxygen atoms in the films do not migrate notably.

Keywords: thin films; atomic layer deposition; aluminum oxide; hydrogen; low temperature physics

Free keywords: ALD; Al2O3; low temperature; heavy water; hydrogen migration; TMA

Contributing organizations

Ministry reporting: Yes

VIRTA submission year: 2021

JUFO rating: 1