A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
Normal Metal-Insulator-Superconductor Tunnel Junctions with Pulsed Laser Deposited Titanium Nitride as Superconductor (2021)
Torgovkin, A., Ruhtinas, A., & Maasilta, I. (2021). Normal Metal-Insulator-Superconductor Tunnel Junctions with Pulsed Laser Deposited Titanium Nitride as Superconductor. IEEE Transactions on Applied Superconductivity, 31(5), Article 1100604. https://doi.org/10.1109/TASC.2021.3058594
JYU-tekijät tai -toimittajat
Julkaisun tiedot
Julkaisun kaikki tekijät tai toimittajat: Torgovkin, Andrii; Ruhtinas, Aki; Maasilta, Ilari
Lehti tai sarja: IEEE Transactions on Applied Superconductivity
ISSN: 1051-8223
eISSN: 2378-7074
Julkaisuvuosi: 2021
Volyymi: 31
Lehden numero: 5
Artikkelinumero: 1100604
Kustantaja: Institute of Electrical and Electronics Engineers (IEEE)
Julkaisumaa: Yhdysvallat (USA)
Julkaisun kieli: englanti
DOI: https://doi.org/10.1109/TASC.2021.3058594
Julkaisun avoin saatavuus: Ei avoin
Julkaisukanavan avoin saatavuus:
Tiivistelmä
Here we report the fabrication of normal metal - insulator - superconductor (NIS) tunnel junctions using superconducting titanium nitride grown by pulsed laser deposition (PLD). The films for NIS junction fabrication were deposited on two different substrates: silicon nitride film and magnesium oxide. TiN films were characterized by means of electrical transport measurements, and films with superconducting transition temperatures above the liquid helium boiling point were chosen for fabrication of NIS junctions. Tunnel junction devices were successfully fabricated using electron beam lithography and shadow evaporation techniques. The insulator layer formation was performed using two different approaches: the tunnel barrier was either formed by direct oxidation of TiN, or by fabrication of an additional aluminum oxide layer. Devices fabricated by direct oxidation showed much more transparent barriers and slightly higher subgap currents, but both types of devices could be used for thermometry. Further optimization of the direct oxidation process may allow electric cooling applications in the future.
YSO-asiasanat: suprajohteet; suprajohtavuus; titaani; ohutkalvot
Liittyvät organisaatiot
Hankkeet, joissa julkaisu on tehty
- Koherentti ja epäkoherentti lämmönjohtavuus nanorakenteissa
- Maasilta, Ilari
- Suomen Akatemia
OKM-raportointi: Kyllä
Raportointivuosi: 2021
JUFO-taso: 1