A1 Journal article (refereed)
Phosphites as precursors in atomic layer deposition thin film synthesis (2021)

Kvamme, K. B., Ruud, A., Weibye, K., Sajavaara, T., & Nilsen, O. (2021). Phosphites as precursors in atomic layer deposition thin film synthesis. Journal of Vacuum Science and Technology A, 39(3), Article 032404. https://doi.org/10.1116/6.0000844

JYU authors or editors

Publication details

All authors or editors: Kvamme, Kristian B.; Ruud, Amund; Weibye, Kristian; Sajavaara, Timo; Nilsen, Ola

Journal or series: Journal of Vacuum Science and Technology A

ISSN: 0734-2101

eISSN: 1520-8559

Publication year: 2021

Volume: 39

Issue number: 3

Article number: 032404

Publisher: American Institute of Physics

Publication country: United States

Publication language: English

DOI: https://doi.org/10.1116/6.0000844

Publication open access: Openly available

Publication channel open access: Partially open access channel

Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/74637

Abstract

We here demonstrate a new route for deposition of phosphorous based materials by atomic layer deposition (ALD) using the phosphites Me3PO3 or Et3PO3 as precursors. These contain phosphorous in the oxidation state (III) and are open for deposition of reduced phases by ALD. We have investigated their applicability for the synthesis of LiPO and AlPO materials and characterized their growth by means of in situ quartz crystal microbalance. Phosphites are good alternatives to the established phosphate-based synthesis routes as they have high vapor pressure and are compatible with water as a coreactant during deposition. The deposited materials have been characterized using XPS, x-ray fluorescence, and ion beam analysis for composition analysis, spectroscopic ellipsometry for thickness, and FTIR for local structure.

Keywords: thin films; atomic layer deposition; phosphates

Free keywords: fosfiitit

Contributing organizations

Ministry reporting: Yes

Reporting Year: 2021

JUFO rating: 1