A1 Journal article (refereed)
Evolution of the microstructure of sputter deposited TaAlON thin films with increasing oxygen partial pressure (2021)


Schalk, N., Saringer, C., Fian, A., Terziyska, V. L., Julin, J., & Tkadletz, M. (2021). Evolution of the microstructure of sputter deposited TaAlON thin films with increasing oxygen partial pressure. Surface and Coatings Technology, 418, Article 127237. https://doi.org/10.1016/j.surfcoat.2021.127237


JYU authors or editors


Publication details

All authors or editorsSchalk, Nina; Saringer, Christian; Fian, Alexander; Terziyska, Velislava L.; Julin, Jaakko; Tkadletz, Michael

Journal or seriesSurface and Coatings Technology

ISSN0257-8972

eISSN1879-3347

Publication year2021

Volume418

Article number127237

PublisherElsevier

Publication countryNetherlands

Publication languageEnglish

DOIhttps://doi.org/10.1016/j.surfcoat.2021.127237

Publication open accessOpenly available

Publication channel open accessPartially open access channel

Publication is parallel published (JYX)https://jyx.jyu.fi/handle/123456789/75411


Abstract

Recently, quaternary oxynitrides of transition metals and aluminum have attracted increasing interest due to their tunable properties. Within the present work, a series of TaAl(O)N films was sputter deposited using constant nitrogen and varying oxygen partial pressures. The films were grown from single element Ta and Al targets. The deposition parameters were adjusted to obtain a Ta/Al atomic ratio of ~50/50 for the oxygen-free film and were held constant for the following depositions, with the exception of the increasing oxygen partial pressure and compensatory decreasing argon partial pressure. Elastic recoil detection analysis revealed oxygen contents of up to ~26 at.%, while the nitrogen content decreased from ~47 at.% in the oxygen-free film to ~35 at.% in the film with the highest oxygen content, resulting in a significant decrease of the metal/non-metal ratio with increasing oxygen partial pressure. The micro- and bonding structures of the films were investigated by X-ray diffraction, X-ray photoelectron spectroscopy, Raman spectroscopy and transmission electron microscopy. All films exhibited a dominating face-centered cubic TaN-based structure with indications for additional nanocrystalline and amorphous phase fractions in the oxygen containing films. In addition, the mechanical properties were evaluated by nanoindentation, yielding a decreasing hardness and elastic modulus with increasing oxygen content.


Keywordsmicrostructuresthin filmssurfacing (activity)

Free keywordsoxynitrides; TaAlON; microstructure; TEM; XPS


Contributing organizations


Ministry reportingYes

Reporting Year2021

JUFO rating2


Last updated on 2024-25-03 at 11:11