A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
Hydrogen and Deuterium Incorporation in ZnO Films Grown by Atomic Layer Deposition (2021)
Kinnunen, S., Lahtinen, M., Arstila, K., & Sajavaara, T. (2021). Hydrogen and Deuterium Incorporation in ZnO Films Grown by Atomic Layer Deposition. Coatings, 11(5), Article 542. https://doi.org/10.3390/coatings11050542
JYU-tekijät tai -toimittajat
Julkaisun tiedot
Julkaisun kaikki tekijät tai toimittajat: Kinnunen, Sami; Lahtinen, Manu; Arstila, Kai; Sajavaara, Timo
Lehti tai sarja: Coatings
eISSN: 2079-6412
Julkaisuvuosi: 2021
Ilmestymispäivä: 03.05.2021
Volyymi: 11
Lehden numero: 5
Artikkelinumero: 542
Kustantaja: MDPI AG
Julkaisumaa: Sveitsi
Julkaisun kieli: englanti
DOI: https://doi.org/10.3390/coatings11050542
Julkaisun avoin saatavuus: Avoimesti saatavilla
Julkaisukanavan avoin saatavuus: Kokonaan avoin julkaisukanava
Julkaisu on rinnakkaistallennettu (JYX): https://jyx.jyu.fi/handle/123456789/75735
Tiivistelmä
Zinc oxide (ZnO) thin films were grown by atomic layer deposition using diethylzinc (DEZ) and water. In addition to depositions with normal water, heavy water (2H2O) was used in order to study the reaction mechanisms and the hydrogen incorporation at different deposition temperatures from 30 to 200 °C. The total hydrogen concentration in the films was found to increase as the deposition temperature decreased. When the deposition temperature decreased close to room temperature, the main source of impurity in hydrogen changed from 1H to 2H. A sufficiently long purging time changed the main hydrogen isotope incorporated in the film back to 1H. A multiple short pulse scheme was used to study the transient steric hindrance. In addition, the effect of the storage of the samples in ambient conditions was studied. During the storage, the deuterium concentration decreased while the hydrogen concentration increased an equal amount, indicating that there was an isotope exchange reaction with ambient H2 and/or H2O.
YSO-asiasanat: ohutkalvot; sinkkioksidi; atomikerroskasvatus; vety
Vapaat asiasanat: ZnO; ALD; heavy water; diethylzinc; ToF-ERDA
Liittyvät organisaatiot
OKM-raportointi: Kyllä
Raportointivuosi: 2021
JUFO-taso: 1