A1 Journal article (refereed)
Hydrogen and Deuterium Incorporation in ZnO Films Grown by Atomic Layer Deposition (2021)

Kinnunen, S., Lahtinen, M., Arstila, K., & Sajavaara, T. (2021). Hydrogen and Deuterium Incorporation in ZnO Films Grown by Atomic Layer Deposition. Coatings, 11(5), Article 542. https://doi.org/10.3390/coatings11050542

JYU authors or editors

Publication details

All authors or editors: Kinnunen, Sami; Lahtinen, Manu; Arstila, Kai; Sajavaara, Timo

Journal or series: Coatings

eISSN: 2079-6412

Publication year: 2021

Publication date: 03/05/2021

Volume: 11

Issue number: 5

Article number: 542

Publisher: MDPI AG

Publication country: Switzerland

Publication language: English

DOI: https://doi.org/10.3390/coatings11050542

Publication open access: Openly available

Publication channel open access: Open Access channel

Publication is parallel published (JYX): https://jyx.jyu.fi/handle/123456789/75735

Abstract

Zinc oxide (ZnO) thin films were grown by atomic layer deposition using diethylzinc (DEZ) and water. In addition to depositions with normal water, heavy water (2H2O) was used in order to study the reaction mechanisms and the hydrogen incorporation at different deposition temperatures from 30 to 200 °C. The total hydrogen concentration in the films was found to increase as the deposition temperature decreased. When the deposition temperature decreased close to room temperature, the main source of impurity in hydrogen changed from 1H to 2H. A sufficiently long purging time changed the main hydrogen isotope incorporated in the film back to 1H. A multiple short pulse scheme was used to study the transient steric hindrance. In addition, the effect of the storage of the samples in ambient conditions was studied. During the storage, the deuterium concentration decreased while the hydrogen concentration increased an equal amount, indicating that there was an isotope exchange reaction with ambient H2 and/or H2O.

Keywords: thin films; zinc oxide; atomic layer deposition; hydrogen

Free keywords: ZnO; ALD; heavy water; diethylzinc; ToF-ERDA

Contributing organizations

Ministry reporting: Yes

Reporting Year: 2021

JUFO rating: 1