ohutkalvot
http://www.yso.fi/onto/yso/p16644
Liittyvät julkaisut
1/7
- Atomic Layer Deposition of Intermetallic Fe4Zn9 Thin Films from Diethyl Zinc (2022) Ghiyasi, Ramin; et al.; A1; OA
- Low-Temperature Atomic Layer Deposition of High-k SbOx for Thin Film Transistors (2022) Yang, Jun; et al.; A1; OA
- Spatial ALD of Al2O3 and ZnO using heavy water (2022) Kinnunen, Sami; et al.; A1
- Using Wave Propagation Simulations and Convolutional Neural Networks to Retrieve Thin Film Thickness from Hyperspectral Images (2022) Erkkilä; et al.; A3; 978-3-030-70787-3
- Al2O3 ALD films grown using TMA + rare isotope 2H216O and 1H218O precursors (2021) Kinnunen, Sami; et al.; A1; OA
- Atomic layer deposition of ternary ruthenates by combining metalorganic precursors with RuO4 as the co-reactant (2021) Minjauw, Matthias M.; et al.; A1
- Atomic scale surface modification of TiO2 3D nano-arrays : plasma enhanced atomic layer deposition of NiO for photocatalysis (2021) Innocent, Jerome W. F.; et al.; A1; OA
- Correlated effects of fluorine and hydrogen in fluorinated tin oxide (FTO) transparent electrodes deposited by sputtering at room temperature (2021) Morán-Pedroso, María; et al.; A1
- Deterministic Modification of CVD Grown Monolayer MoS2 with Optical Pulses (2021) Turunen, Mikko T.; et al.; A1; OA
- Effective suppression of nanotextured black silicon surface recombination channels by aluminum oxide : comparison from sputtered and ALD grown films (2021) Parashar, Piyush Kumar; et al.; A1
