atomic layer deposition
http://www.yso.fi/onto/yso/p27468
Related publications
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- Al2O3 ALD films grown using TMA + rare isotope 2H216O and 1H218O precursors (2021) Kinnunen, Sami; et al.; A1; OA
- Effective suppression of nanotextured black silicon surface recombination channels by aluminum oxide : comparison from sputtered and ALD grown films (2021) Parashar, Piyush Kumar; et al.; A1
- Hydrogen and Deuterium Incorporation in ZnO Films Grown by Atomic Layer Deposition (2021) Kinnunen, Sami; et al.; A1; OA
- Mechanical and optical properties of as-grown and thermally annealed titanium dioxide from titanium tetrachloride and water by atomic layer deposition (2021) Ylivaara, Oili M.E.; et al.; A1; OA
- Phosphites as precursors in atomic layer deposition thin film synthesis (2021) Kvamme, Kristian B.; et al.; A1; OA
- A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films (2020) Cao, LiAo; et al.; A1; OA
- Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films (2020) Napari, Mari; et al.; A1; OA
- Atomic layer deposition of localised boron- and hydrogen-doped aluminium oxide using trimethyl borate as a dopant precursor (2020) Mattelaer, Felix; et al.; A1; OA
- Reaction Pathways for Atomic Layer Deposition with Lithium Hexamethyl Disilazide, Trimethyl Phosphate, and Oxygen Plasma (2020) Werbrouck, Andreas; et al.; A1
- The co-reactant role during plasma enhanced atomic layer deposition of palladium (2020) Feng, Ji-Yu; et al.; A1
