atomic layer deposition
http://www.yso.fi/onto/yso/p27468
Related publications
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- A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films (2020) Cao, LiAo; et al.; A1; OA
- Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films (2020) Napari, Mari; et al.; A1; OA
- Atomic layer deposition of localised boron- and hydrogen-doped aluminium oxide using trimethyl borate as a dopant precursor (2020) Mattelaer, Felix; et al.; A1; OA
- Reaction Pathways for Atomic Layer Deposition with Lithium Hexamethyl Disilazide, Trimethyl Phosphate, and Oxygen Plasma (2020) Werbrouck, Andreas; et al.; A1
- The co-reactant role during plasma enhanced atomic layer deposition of palladium (2020) Feng, Ji-Yu; et al.; A1
- Ti Alloyed α-Ga2O3 : route towards Wide Band Gap Engineering (2020) Barthel, Armin; et al.; A1; OA
- In-situ annealing characterization of atomic-layer-deposited Al2O3 in N2, H2 and vacuum atmospheres (2019) Broas, Mikael; et al.; A1; OA
- Structural and Optical Characterization of ZnS Ultrathin Films Prepared by Low-Temperature ALD from Diethylzinc and 1.5-Pentanedithiol after Various Annealing Treatments (2019) Włodarski, M.; et al.; A1; OA
- Thermal atomic layer deposition of AlOxNy thin films for surface passivation of nano-textured flexible silicon (2019) Parashar, Piyush K.; et al.; A1
- Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma (2018) Rontu, Ville; et al.; A1; OA
